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多孔硅表面磁控溅射沉积Ti膜的形貌研究

发表时间:2014-02-15  浏览量:1516  下载量:417
全部作者: 展长勇,蒋稳,邹宇,任丁,伍建春,杨斌,黄宁康
作者单位: 辐射物理及技术教育部重点实验室,四川大学原子核科学技术研究所
摘 要: 采用磁控溅射方法分别在随机刻蚀的多孔硅和孔径分别为2.5,12,15 μm的多孔硅阵列上沉积Ti膜。讨论了不同偏压条件下沉积Ti膜的形貌和多孔硅刻蚀形貌对Ti膜的影响。研究表明:未加偏压时,Ti膜在多孔硅阵列上以柱状晶和岛状生长模式生长,在硅的原刻蚀纹路上堆积,造成沉积的阴影效应,Ti膜均匀性差;施加偏压后,沉积的Ti膜相对平整,离子经偏压加速后的再溅射效应有效减小了Ti原子在刻蚀纹路和孔口边缘上的堆积,减小了表面和孔内的沉积厚度比,孔内的Ti膜沉积深度达55 μm以上。可以看出,多孔硅表面和孔壁形貌也会影响Ti膜的形貌,平滑的孔壁要优于粗糙的孔壁。研究为多孔硅在能量转换和探测器领域的发展提供了孔内制备薄膜的方法和沉积机制。
关 键 词: 薄膜物理学;多孔硅;磁控溅射;偏压;Ti膜
Title: Morphology study of titanium film deposited on silicon macropores by magnetron sputtering
Author: ZHAN Changyong, JIANG Wen, ZOU Yu, REN Ding, WU Jianchun, YANG Bin, HUANG Ningkang
Organization: Key Laboratory of Radiation Physics and Technology of Ministry of Education, Institute of Nuclear Science and Technology, Sichuan University
Abstract: Titanium films were deposited on silicon macropores with pore diameters of 2.5, 12, 15 μm and random etched size. Morphologies of titanium films deposited at different bias voltages are presented and the effects of etched morphology on titanium film are discussed. The results indicate that, without applying bias voltages, titanium film grows as columnar crystals and island growth mode on pore wall and a shadow effect is due to the gathering of titanium atoms on the etched bulges and edges of silicon, which makes the film uneven. The gathering of titanium atoms on the bulges and edges is reduced due to sputtering of the ions accelerated by bias voltages. The titanium thickness difference of surface and bottom is decreased by bias voltages. The deposition depth of titanium film in the macropores can reach more than 55 μm. It is clear that the morphologies of silicon macropores surface and pore wall also play an important role in the deposition of titanium film. Smooth wall is superior to rough wall. This work provides the fabricating method and formation study of film in pore for future application of silicon macropores in energy conversion and detection of energetic particle.
Key words: thin film physics; silicon macropores; magnetron sputtering; bias voltage; titanium film
发表期数: 2014年2月第3期
引用格式: 展长勇,蒋稳,邹宇,等. 多孔硅表面磁控溅射沉积Ti膜的形貌研究[J]. 中国科技论文在线精品论文,2014,7(3):262-268.
 
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