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纳米级超精细薄膜物理沉积工艺机理研究

发表时间:2015-12-15  浏览量:1727  下载量:808
全部作者: 宋太伟,高伟波,余冬冬,方祥,杨光
作者单位: 上海建冶科技工程股份有限公司
摘 要: 以热蒸镀和磁控溅射工艺为基础,分析解决如何用简捷的物理镀膜方法,实现1~2 nm厚度超精细薄膜的均匀可控沉积。在对热蒸镀的分析中,以控制源材蒸发量为基础,同时结合对蒸发物质粒子的路径控制。对于磁控溅射工艺,分析外加磁场、电场及压力、温度对腔内气体的粒子成分与运行轨迹的影响,用宏观统计逻辑建立起理想的磁控沉积方程组,并定性分析被溅射物质的粒子大小与运行轨迹等与外部可变可控条件的关系,以指导设计可实现1~2 nm厚度薄膜磁控沉积的设备。
关 键 词: 材料合成与加工工艺;电子束蒸镀;磁控溅射;沉积速率
Title: Theoretical study of thin film deposition within nanometer thickness by PVD
Author: SONG Taiwei, GAO Weibo, YU Dongdong, FANG Xiang, YANG Guang
Organization: Shanghai Jianye Technology Engineering Co. Ltd.
Abstract: In this paper, the deposition of thin film with a thickness of 1-2 nm was realized by traditional physical vapor deposition based on thermo-evaporation and magnetron sputtering. For the thermo-evaporation, controlling of the source evaporation and the motion path of the particles was analyzed. For the magnetron sputtering, the effects of electro-magnetic field, pressure and temperature on the types of particles and motion paths was also analyzed. The ideal deposition equation was built by globally statistic logic. Both of which are useful guideline for the equipment design to realize a deposition thickness of 1-2 nm.
Key words: material synthesizing and processing techniques; E-beam evaporation; magnetron sputtering; deposition rate
发表期数: 2015年12月第23期
引用格式: 宋太伟,高伟波,余冬冬,等. 纳米级超精细薄膜物理沉积工艺机理研究[J]. 中国科技论文在线精品论文,2015,8(23):2502-2507.
 
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