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硅表面HEMA和NIPAM聚合物刷点阵组装
发表时间：2020-03-31 浏览量：1578 下载量：269
| 全部作者： | 路小彬 |
| 作者单位： | 黔南民族师范学院化学化工学院 |
| 摘 要： | 嵌段共聚物纳米刻蚀技术由于具有大面积、大批量生产的优点，可应用于集成电路硅片、生物芯片等技术领域。本文对该技术进行了改进，首先，通过聚苯乙烯-聚(4-乙烯基吡啶)（polystyrene-block-poly (4-vinylpyridine)，PS-b-P4VP）胶束溶液旋涂得到其自组装点阵模板，然后通过稀氢氟酸腐蚀在硅表面上形成相应的硅-氢（SiHx）纳米坑点阵图案，进而由原子转移自由基聚合反应（atom transfer radical polymerization，ATRP）生成甲基丙烯酸-2-羟基乙酯（hydroxyethyl methacrylate，HEMA）和N-异丙基丙烯酰胺（N-isopropyl acrylamide，NIPAM）聚合物刷的纳米点阵结构。硅和其表面的HEMA和NIPAM聚合物刷软材料构成新颖的复合材料，同时兼容了无机和有机材料的优点，扩大了其在催化、吸附、分离和生物分子检测领域的应用。加之其良好的生物兼容性，可直接用于人体和动物体，而且硅表面高分子刷丰富的功能团，也为后续的端基改性提供了基础。 |
| 关 键 词： | 化学其他学科；嵌段共聚物点阵；稀氢氟酸腐蚀；SiHx纳米坑；甲基丙烯酸-2-羟基乙酯；N-异丙基丙烯酰胺 |
| Title： | Dot array assembly of hydroxyethyl methacrylate (HEMA) and N-isopropyl acrylamide (NIPAM) polymer brushes on silicon surfaces |
| Author： | LU Xiaobin |
| Organization： | School of Chemistry and Chemical Engineering, Qiannan Normal University for Nationalities |
| Abstract： | The nano-etching technology of block copolymer can be applied in the field of integrated circuit silicon and biological chip because of its advantages of large area and mass production. The technique was improved in this article. Through spin-coating the polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) micelle solution, the self-assembled dot array template was prepared. The silicon surface was then etched with dilute hydrogen fluoride to form a dot array pattern of SiHx nanopits. Furthermore, the nanoarray structure of the hydroxyethyl methacrylate (HEMA) and N-isopropyl acrylamide (NIPAM) polymer brushes was generated by atom transfer radical polymerization (ATRP). Silicon and soft material of HEMA and NIPAM polymer brushes on its surface constituted a novel composite material. At the same time, this material is compatible with the advantages of inorganic and organic materials, which extends its application in the fields of catalysis, adsorption, separation and biomolecular detection. In addition to its good biological compatibility, it can be directly used in human and animal body. The abundant functional groups of the polymer brushes on the silicon surface also provide the basis for the subsequent end group modification. |
| Key words： | other subjects of chemistry; dot array of block copolymer; etching using dilute hydrogen fluoride; SiHx nanopits; hydroxyethyl methacrylate (HEMA); N-isopropyl acrylamide (NIPAM) |
| 发表期数： | 2020年3月第1期 |
| 引用格式： | 路小彬. 硅表面HEMA和NIPAM聚合物刷点阵组装[J]. 中国科技论文在线精品论文，2020，13（1）：90-97. |
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