您的位置:首页  > 论文页面

直流诱导的高功率脉冲非平衡磁控溅射

发表时间:2010-07-31  浏览量:1169  下载量:456
全部作者: 牟宗信,贾莉,牟晓东,董闯
作者单位: 大连理工大学物理与光电工程学院三束材料改性教育部重点实验室
摘 要: 研究直流诱导的高功率脉冲非平衡磁控溅射的现象和机制。圆形平面磁控靶与同轴线圈构成非平衡磁控溅射靶;采用直流磁控溅射电源放电,同轴线圈电流改变非平衡磁控溅射靶的非平衡度;控制放电的气压、功率和线圈电流等参数形成大幅度、低频的高功率脉冲放电,研究高功率脉冲放电特性与线圈电流、气压、功率等放电参数的联系。圆形平面偏压电极测量高功率脉冲的浮置电位和脉冲离子电流,分析脉冲波形的特征和形成原因及影响因素,根据磁绝缘二极管理论定性计算出的脉冲离子电流、电子电流等数值符合实验结果。
关 键 词: 电气工程;放电;磁控;脉冲技术
Title: High power pulse unbalanced magnetron sputtering induced by direct current
Author: MU Zongxin, JIA Li, MU Xiaodong, DONG Chuang
Organization: Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, School of Physics and Optoelectronic Engineering, Dalian University of Technology
Abstract: This paper reports the phenomenon and mechanism of the direct current induced high power pulse unbalanced magnetron sputtering. The high power pulse discharge of large amplitude and low frequency was formed via controlling the discharge parameters such as the pressure, power and coil current and so on. The study of the relation between the high power pulse discharge properties and the discharge parameters was carried out. The analysis on the characteristics, mechanism and influential factors of pulse waveform was carried out, and based on the qualitative theory of magnetically insulated diode, the values including pulsed ion current and electron current and the like were calculated, which were conform to the test results.
Key words: electrical engineering;discharge; magnetron; pulse technology
发表期数: 2010年7月第14期
引用格式: 牟宗信,贾莉,牟晓东,等. 直流诱导的高功率脉冲非平衡磁控溅射[J]. 中国科技论文在线精品论文,2010,3(14):1506-1510.
 
0 评论数 0
暂无评论
友情链接