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熔融石英衬底上生长高质量的SrTiO3薄膜

发表时间:2010-08-15  浏览量:1147  下载量:400
全部作者: 邢杰,高兴宇,姚坚毅
作者单位: 中国地质大学(北京)材料科学与工程学院
摘 要: 利用磁控溅射技术在熔融石英衬底上生长SrTiO3薄膜,然后对薄膜进行不同温度的后退火处理,利用X射线衍射和扫描电镜表征薄膜的微观结构。实验发现:未经退火处理的SrTiO3薄膜样品都呈非晶态,经过O2气氛退火处理后,薄膜开始结晶,晶化程度依赖于原位生长温度、退火温度和退火时间。研究结果表明:原位生长温度大于550℃,后退火温度为700℃,退火时间不低于2 h,可以保证在熔融石英衬底上获得一个完整、致密、结晶良好的SrTiO3薄膜。
关 键 词: 凝聚态物理学;SrTiO3薄膜;无定形;结晶
Title: High quality SrTiO3 thin film grown on fused quartz wafers
Author: XING Jie, GAO Xingyu, YAO Jianyi
Organization: School of Materials Science and Technology, China University of Geosciences (Beijing)
Abstract: SrTiO3 thin films have been grown on fused�quartz wafers with radio frequency magnetron sputtering. Measurements of X�ray diffraction and scanning electron microscope have been employed to characterize the microstructure of these films. The dependence of structure and morphology of SrTiO3 thin films on the substrate temperature and post annealing has been studied in detail. The results show that a higher deposition temperature (>550℃) and a post annealing at 700℃ in oxygen ambience for at least two hours are necessary conditions for the compactness, integrality and good crystallization of SrTiO3 thin films.
Key words: condensed matter physics; SrTiO3 thin film; amorphous; crystallized
发表期数: 2010年8月第15期
引用格式: 邢杰,高兴宇,姚坚毅. 熔融石英衬底上生长高质量的SrTiO3薄膜[J]. 中国科技论文在线精品论文,2010,3(15):1553-1558.
 
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